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MoOx thin films deposition by reactive RF-magnetron sputtering

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dc.contributor Bertomeu i Balagueró, Joan
dc.creator Ramis-Masachs, Mireia
dc.date 2018-09-14T13:51:40Z
dc.date 2018-09-14T13:51:40Z
dc.date 2018-01
dc.date.accessioned 2024-12-16T10:26:40Z
dc.date.available 2024-12-16T10:26:40Z
dc.identifier http://hdl.handle.net/2445/124577
dc.identifier.uri http://fima-docencia.ub.edu:8080/xmlui/handle/123456789/21412
dc.description Treballs Finals de Grau de Física, Facultat de Física, Universitat de Barcelona, Curs: 2018, Tutor: Joan Bertomeu
dc.description Sub-stoichiometric molybdenum oxide (MoOx, x < 3) thin films are deposited and analyzed to find optimum parameters for its use in heterojunction solar-cells. Deposition is done on n-type crystalline silicon wafer and glass substrates by reactive RF-magnetron sputtering. Oxygen partial pressure and deposition pressure are the two parameters used to vary stoichiometry inflluencing other characteristics. Stoichiometric composition, thickness, electrical properties and optical response have been studied to characterize the deposited thin films. MoOx, as other transition metal oxides, on the n-type silicon wafer act as a hole-selective layer. It is a good way of providing a p+-n junction without using dopant.
dc.format 5 p.
dc.format application/pdf
dc.language eng
dc.rights cc-by-nc-nd (c) Ramis, 2018
dc.rights http://creativecommons.org/licenses/by-nc-nd/3.0/es/
dc.rights info:eu-repo/semantics/openAccess
dc.source Treballs Finals de Grau (TFG) - Física
dc.subject Molibdè
dc.subject Cèl·lules solars
dc.subject Treballs de fi de grau
dc.subject Molybdenum
dc.subject Solar cells
dc.subject Bachelor's theses
dc.title MoOx thin films deposition by reactive RF-magnetron sputtering
dc.type info:eu-repo/semantics/bachelorThesis


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