DSpace Repository

Auger quenching-based modulation of electroluminescence from ion-implanted silicon nanocrystals

Show simple item record

dc.creator Carreras, Josep
dc.creator Bonafos, Caroline
dc.creator Montserrat i Martí, Josep
dc.creator Domínguez, Carlos (Domínguez Horna)
dc.creator Albiol i Cobos, Jordi
dc.creator Garrido Fernández, Blas
dc.date 2011-04-12T08:15:27Z
dc.date 2011-04-12T08:15:27Z
dc.date 2008
dc.date.accessioned 2024-12-16T10:26:29Z
dc.date.available 2024-12-16T10:26:29Z
dc.identifier 0957-4484
dc.identifier http://hdl.handle.net/2445/17583
dc.identifier 585158
dc.identifier.uri http://fima-docencia.ub.edu:8080/xmlui/handle/123456789/21168
dc.description We describe high-speed control of light from silicon nanocrystals under electrical excitation. The nanocrystals are fabricated by the ion implantation of Si+ in the 15?nm thick gate oxide of a field effect transistor at 6.5?keV. A characteristic read-peaked electroluminescence is obtained either by DC or AC gate excitation. However, AC gate excitation is found to have a frequency response that is limited by the radiative lifetimes of silicon nanocrystals, which makes impossible the direct modulation of light beyond 100?kb?s?1 rates. As a solution, we demonstrate that combined DC gate excitation along with an AC channel hot electron injection of electrons into the nanocrystals may be used to obtain a 100% deep modulation at rates of 200?Mb?s?1 and low modulating voltages. This approach may find applications in biological sensing integrated into CMOS, single-photon emitters or direct encoding of information into light from Si-nc doped with erbium systems, which exhibit net optical gain. In this respect, the main advantage compared to conventional electro-optical modulators based on plasma dispersion effects is the low power consumption (104 times smaller) and thus the inherent large scale of integration. A detailed electrical characterization is also given. An Si/SiO2 barrier change from ?b = 3.2 to 4.2?eV is found while the injection mechanism is changed from Fowler?Nordheim to channel hot electron, which is a clear signature of nanocrystal charging and subsequent electroluminescence quenching.
dc.format 17 p.
dc.format application/pdf
dc.language eng
dc.publisher IOP Publishing Ltd.
dc.relation Versió postprint del document publicat a http://dx.doi.org/10.1088/0957-4484/19/20/205201
dc.relation Nanotechnology, 2008, vol. 19, núm. 20, p. 205201-1-205201-9
dc.relation http://dx.doi.org/10.1088/0957-4484/19/20/205201
dc.relation info:eu-repo/grantAgreement/EC/FP7/224312/EU//HELIOS
dc.rights (c) IOP Publishing, 2009
dc.rights info:eu-repo/semantics/openAccess
dc.source Articles publicats en revistes (Enginyeria Electrònica i Biomèdica)
dc.subject Electrònica
dc.subject Matèria condensada
dc.subject Nanocristalls semiconductors
dc.subject Electronics
dc.subject Condensed matter
dc.subject Semiconductor nanocrystals
dc.title Auger quenching-based modulation of electroluminescence from ion-implanted silicon nanocrystals
dc.type info:eu-repo/semantics/article
dc.type info:eu-repo/semantics/acceptedVersion


Files in this item

Files Size Format View

There are no files associated with this item.

This item appears in the following Collection(s)

Show simple item record

Search DSpace


Advanced Search

Browse

My Account