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Efficiency and reliability enhancement of silicon nanocrystal field-effect luminescence from nitride-oxide gate stacks

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dc.creator Perálvarez Barrera, Mariano José
dc.creator Carreras, Josep
dc.creator Barreto, Jorge
dc.creator Morales, A. (Ángel)
dc.creator Domínguez, Carlos (Domínguez Horna)
dc.creator Garrido Fernández, Blas
dc.date 2011-01-25T13:05:31Z
dc.date 2011-01-25T13:05:31Z
dc.date 2008-06-17
dc.date.accessioned 2024-12-16T10:26:02Z
dc.date.available 2024-12-16T10:26:02Z
dc.identifier 1077-3118
dc.identifier http://hdl.handle.net/2445/15725
dc.identifier 585157
dc.identifier.uri http://fima-docencia.ub.edu:8080/xmlui/handle/123456789/20420
dc.description We report on a field-effect light emitting device based on silicon nanocrystals in silicon oxide deposited by plasma-enhanced chemical vapor deposition. The device shows high power efficiency and long lifetime. The power efficiency is enhanced up to 0.1 %25 by the presence of a silicon nitride control layer. The leakage current reduction induced by this nitride buffer effectively increases the power efficiency two orders of magnitude with regard to similarly processed devices with solely oxide. In addition, the nitride cools down the electrons that reach the polycrystalline silicon gate lowering the formation of defects, which significantly reduces the device degradation.
dc.format 3 p.
dc.format application/pdf
dc.language eng
dc.publisher American Institute of Physics
dc.relation Reproducció del document publicat a: http://dx.doi.org/10.1063/1.2939562
dc.relation Applied Physics Letters, 2008, vol. 92, núm. 24, p. 241104-1-241104-3
dc.relation http://dx.doi.org/10.1063/1.2939562
dc.relation info:eu-repo/grantAgreement/EC/FP7/224312/EU//HELIOS
dc.rights (c) American Institute of Physics, 2008
dc.rights info:eu-repo/semantics/openAccess
dc.source Articles publicats en revistes (Enginyeria Electrònica i Biomèdica)
dc.subject Microelectrònica
dc.subject Semiconductors
dc.subject Microelectronics
dc.subject Semiconductors
dc.title Efficiency and reliability enhancement of silicon nanocrystal field-effect luminescence from nitride-oxide gate stacks
dc.type info:eu-repo/semantics/article
dc.type info:eu-repo/semantics/publishedVersion


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